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Surface Functionalization Lab

The laboratory is equipped with two types of ultra-thin film and coating equipment:

  • Atomic Layer Deposition (ALD)
  • Physical Vapour Deposition (PVD)

Atomic Layer Deposition (ALD)

Physical Vapour Deposition (PVD)

Lab supervisor

Anna Taratuta, PhD, Eng.

Atomic Layer Deposition (ALD)

Beneq TFS200 – Single atomic layer deposition system

  • the system is capable of producing thin films at temperatures of up to 500°C
  • the process takes place in a nitrogen atmosphere of 5.0 mbar 
  • internal chamber dimensions: diameter 200mm, height 90mm
  • we have a wide range of precursors, such as: zinc, tin, aluminium, titanium, zirconium, tantalum
  • the layer can consist of one or more of the precursors or their oxides
  • it is possible to control both the quantity and the duration of each cycle

Beneq TFS200 parameters:

  • 2 chambers 200 mm x 95 mm
  • 1 chamber 200 mm x 18 mm
  • 4 liquid sources
  • 2 heated sources
  • 2 gas lines
  • O3 delivery system
  • Nanoparticle coating module
  • Excellent adhesion – chemisorption
  • Sequentiality
  • Repeatability,
  • High throughput,
  • Low process temperature,
  • Controlled thickness

Physical Vapour Deposition (PVD)

Physical Vapour Deposition (PVD) system equipped with a magnetron sputtering module.

  • The basic pressure in the chamber is 5×10-7 mbar – UHV (Ultra High Vacuum) standard.
  • Possibility to install up to 3 magnetron guns and two types of DC and RF power supply, together with a co-deposition module and gas lines for nitrogen and oxygen.
  • Chamber, showing magnetron sputtering source in operation

Moorfield’s system, the nanoPVD-S10A, is a magnetron sputtering system for sputtering metals or insulating materials such as oxides and nitrides. The systems are equipped with turbomolecular pumping systems to ensure low contamination operation. Co-deposition is possible, as well as reactive sputtering using a gas/pressure control module that can handle up to three process gases. The system works with classic industrial targets (e.g. TiN, TiO2, C) and substrates up to 4″ in size.

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in Medicine and Sport "Assist Med. Sport Silesia"

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